Tag: non-contact AFM

Photoresponsive Photoacid-Macroion Nano-Assemblies

In mother nature, the concept of self-assembly is vital for life, as it generates much of the functionality of living cells. It also bears great synthetic potential for the formation of versatile, switchable, and functional nanostructures.*

Noncovalent interactions can be triggered by external influences, such as the change of pH, light irradiation, thermal activation, introduction of a magnetic field, moisture, or redox response. Of high interest are light-responsive systems, for example in the fields of sensors or therapy, and, thus, it is desirable to explore novel concepts toward light-triggerable self-assembly.*

In the article “Photoresponsive Photoacid-Macroion Nano-Assemblies” Alexander Zika, Sarah Bernhardt and Franziska Gröhn present light-responsive nano-assemblies with light-switchable size based on photoacids.*

Anionic disulfonated napthol derivates and cationic dendrimer macroions are used as building blocks for electrostatic self-assembly. Nanoparticles are already formed under the exclusion of light as a result of electrostatic interactions. Upon photoexcitation, an excited-state dissociation of the photoacidic hydroxyl group takes place, which leads to a more highly charged linker molecule and, subsequently, to a change in size and structure of the nano-assemblies. The effects of the charge ratio and the concentration on the stability have been examined with absorption spectroscopy and -potential measurements.*

The influence of the chemical structure of three isomeric photoacids on the size and shape of the nanoscale aggregates has been studied by dynamic light scattering and atomic force microscopy, revealing a direct correlation of the strength of the photoacid with the changes of the assemblies upon irradiation.*

NanoWorld Ultra-Short AFM Cantilevers of the USC-F0.3-k0.3 type ( typical force constant 0.3 N/m ) were operated in tapping mode for the Atomic Force Microscopy (AFM) images presented in the article.*

Figure 1 a from “Photoresponsive Photoacid-Macroion Nano-Assemblies” by Alexander Zika et al: Assembly formation and photoresponse of the dendrimer–photoacid system at a charge ratio of r = 0.25: (a) AFM height images before (right) and after (left) irradiation. Figure 1 a from “Photoresponsive Photoacid-Macroion Nano-Assemblies” by Alexander Zika et al: Assembly formation and photoresponse of the dendrimer–photoacid system at a charge ratio of r = 0.25: (a) AFM height images before (right) and after (left) irradiation.
Figure 1 a from “Photoresponsive Photoacid-Macroion Nano-Assemblies” by Alexander Zika  et al:
Assembly formation and photoresponse of the dendrimer–photoacid system at a charge ratio of r = 0.25: (a) AFM height images before (right) and after (left) irradiation. Please refer to the full article for the full figure https://www.mdpi.com/2073-4360/12/8/1746

*Alexander Zika, Sarah Bernhardt and Franziska Gröhn
Photoresponsive Photoacid-Macroion Nano-Assemblies
Polymers 2020, 12, 1746
DOI: 10.3390/polym12081746

Please follow this external link to read the full article: https://www.mdpi.com/2073-4360/12/8/1746

Open Access : The article “Photoresponsive Photoacid-Macroion Nano-Assemblies” by Alexander Zika, Sarah Bernhardt and Franziska Gröhn is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

Influence of Ultraviolet Radiation Exposure Time on Styrene-Ethylene-Butadiene-Styrene (SEBS) Copolymer

In the article «Influence of Ultraviolet Radiation Exposure Time on Styrene-Ethylene-Butadiene-Styrene (SEBS) Copolymer» Daniel Garcia-Garcia , José Enrique Crespo-Amorós, Francisco Parres and María Dolores Samper describe how they studied the effect of ultraviolet radiation on styrene-ethylene-butadiene-styrene (SEBS) at different exposure times in order to obtain a better understanding of the mechanism of ageing.*

The results obtained for the SEBS, in relation to the duration of exposure, showed superficial changes that cause a decrease in the surface energy (s) and, therefore, a decrease in surface roughness. This led to a reduction in mechanical performance, decreasing the tensile strength by about 50% for exposure times of around 200 hours.*

NanoWorld Pointprobe® NCH AFM probes were used in the Atomic force microscopy (AFM) applied to determine the surface topography and roughness of the aged samples.

Figure 4 from «Influence of Ultraviolet Radiation Exposure Time on Styrene-Ethylene-Butadiene-Styrene (SEBS) Copolymer» by Daniel Garcia-Garcia et al.: Atomic force microscopy (AFM) surface of SEBS: (a) without exposure (T0), (b) UV exposure T2, (c) UV exposure T7 and (d) UV exposure T9.


Figure 4 from «Influence of Ultraviolet Radiation Exposure Time on Styrene-Ethylene-Butadiene-Styrene (SEBS) Copolymer» by Daniel Garcia-Garcia et al.:
Atomic force microscopy (AFM) surface of SEBS: (a) without exposure (T0), (b) UV exposure T2, (c) UV exposure T7 and (d) UV exposure T9.

*Daniel Garcia-Garcia , José Enrique Crespo-Amorós, Francisco Parres and María Dolores Samper
Influence of Ultraviolet Radiation Exposure Time on Styrene-Ethylene-Butadiene-Styrene (SEBS) Copolymer
Polymers 2020, 12, 862
DOI: https://doi.org/10.3390/polym12040862

Please follow this external link to read the full article: https://www.mdpi.com/2073-4360/12/4/862

Open Access : The article “Influence of Ultraviolet Radiation Exposure Time on Styrene-Ethylene-Butadiene-Styrene (SEBS) Copolymer» byDaniel Garcia-Garcia , José Enrique Crespo-Amorós, Francisco Parres and María Dolores Samper is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

Self-assembled PCBM bilayers on graphene and HOPG examined by AFM and STM

In the article «Self-assembled PCBM bilayers on graphene and HOPG examined by AFM and STM” Yanlong Li, Chuanhui Chen, John Burton, Kyungwha Park, James R Heflin and Chenggang Tao demonstrate that PCBM molecules self-assemble into bilayer structures on graphene and HOPG substrates. They used Atomic Force Microscopy (AFM) and Scanning Tunneling Microscopy (STM), and analyzed the observed morphology by comparison to molecular models.*

The AFM measurements were carried out in a dark environment. NanoWorld™ Pointprobe® NCST AFM probes were used in soft tapping mode and simultaneous height and phase images were acquired and reproduced across multiple samples.*

The results of this study shed light on improvement of the energy efficiency in solar cells containing graphene and organic molecules, by increasing the donor–acceptor interface area and could provide valuable insight into fabrication of new hybrid, ordered structures for applications to organic solar cells.*

Figure 5. from “Self-assembled PCBM bilayers on graphene and HOPG examined by AFM and STM” by Yanlong Li et al.: AFM images of PCBM bilayer and size distributions of holes at different conditions. (a) AFM image of a PCBM bilayer before annealing. (b) AFM image of a PCBM bilayer after annealing at 140 °C. (c) AFM image of a PCBM bilayer after annealing at 160 °C. (d) Area distribution histogram of holes (without PCBM area) obtained from measurements of the area of holes in AFM images of before (green) and after annealing at 140 °C (dark red) and 160 °C (dark blue). Monolithic silicon cantilevers (NCST, NANO WORLD) with a spring constant of 7.4 N m−1, first longitudinal resonance frequencies between 120 and 205 kHz, and nominal tip radius of 8 nm were employed in soft tapping mode. Simultaneous height and phase images were acquired and reproduced across multiple samples.
Figure 5. from “Self-assembled PCBM bilayers on graphene and HOPG examined by AFM and STM” by Yanlong Li et al.: AFM images of PCBM bilayer and size distributions of holes at different conditions. (a) AFM image of a PCBM bilayer before annealing. (b) AFM image of a PCBM bilayer after annealing at 140 °C. (c) AFM image of a PCBM bilayer after annealing at 160 °C. (d) Area distribution histogram of holes (without PCBM area) obtained from measurements of the area of holes in AFM images of before (green) and after annealing at 140 °C (dark red) and 160 °C (dark blue).

*Yanlong Li, Chuanhui Chen, John Burton, Kyungwha Park, James R Heflin, Chenggang Tao
Self-assembled PCBM bilayers on graphene and HOPG examined by AFM and STM
Nanotechnology, Volume 29, Number 18 (2018)
DOI: https://doi.org/10.1088/1361-6528/aab00a

Open Access The article “Self-assembled PCBM bilayers on graphene and HOPG examined by AFM and STM” by Yanlong Li et al. is licensed under a Creative Commons Attribution 3.0 International License. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI. To view a copy of this license, visit https://creativecommons.org/licenses/by/3.0/